MOS Capacitance-Voltage Characteristics: V. Methods to Enhance the Trapping Capacitance
J. Semicond. 2012, 33(2): 021001
doi: 10.1088/1674-4926/33/2/021001
Capacitance-voltage analysis of a high-k dielectric on silicon
J. Semicond. 2012, 33(2): 022001
doi: 10.1088/1674-4926/33/2/022001
Photoelectric properties of Cu2ZnSnS4 thin films deposited by thermal evaporation
J. Semicond. 2012, 33(2): 022002
doi: 10.1088/1674-4926/33/2/022002
Synthesis and efficient field emission characteristics of patterned ZnO nanowires
J. Semicond. 2012, 33(2): 023001
doi: 10.1088/1674-4926/33/2/023001
Analysis of the p+/p window layer of thin film solar cells by simulation
J. Semicond. 2012, 33(2): 023002
doi: 10.1088/1674-4926/33/2/023002
J. Semicond. 2012, 33(2): 024001
doi: 10.1088/1674-4926/33/2/024001
Influence of back-gate stress on the back-gate threshold voltage of a LOCOS-isolated SOI MOSFET
J. Semicond. 2012, 33(2): 024002
doi: 10.1088/1674-4926/33/2/024002
J. Semicond. 2012, 33(2): 024003
doi: 10.1088/1674-4926/33/2/024003
Energy capability enhancement for isolated extended drain NMOS transistors
J. Semicond. 2012, 33(2): 024004
doi: 10.1088/1674-4926/33/2/024004
Distributed feedback quantum cascade lasers operating in continuous-wave mode at λ ≈ 7.6 μm
J. Semicond. 2012, 33(2): 024005
doi: 10.1088/1674-4926/33/2/024005
Fabrication and temperature dependence of a GaInP/GaAs/Ge tandem solar cell
J. Semicond. 2012, 33(2): 024006
doi: 10.1088/1674-4926/33/2/024006
S-band low noise amplifier using 1 μm InGaAs/InAlAs/InP pHEMT
J. Semicond. 2012, 33(2): 025001
doi: 10.1088/1674-4926/33/2/025001
Analysis and implementation of an improved recycling folded cascode amplifier
J. Semicond. 2012, 33(2): 025002
doi: 10.1088/1674-4926/33/2/025002
A binary-weighted 64-dB programmable gain amplifier with a DCOC and AB-class buffer
J. Semicond. 2012, 33(2): 025003
doi: 10.1088/1674-4926/33/2/025003
A 0.18 μm CMOS Gilbert low noise mixer with noise cancellation
J. Semicond. 2012, 33(2): 025004
doi: 10.1088/1674-4926/33/2/025004
A 65-nm low-noise low-cost ∑Δ modulator for audio applications
J. Semicond. 2012, 33(2): 025005
doi: 10.1088/1674-4926/33/2/025005
A monolithic RF transceiver for DC-OFDM UWB
J. Semicond. 2012, 33(2): 025006
doi: 10.1088/1674-4926/33/2/025006
J. Semicond. 2012, 33(2): 025007
doi: 10.1088/1674-4926/33/2/025007
A wide-band low phase noise LC-tuned VCO with constant KVCO/ωosc for LTE PLL
J. Semicond. 2012, 33(2): 025008
doi: 10.1088/1674-4926/33/2/025008
An output amplitude configurable wideband automatic gain control with high gain step accuracy
J. Semicond. 2012, 33(2): 025009
doi: 10.1088/1674-4926/33/2/025009
SHA-less architecture with enhanced accuracy for pipelined ADC
J. Semicond. 2012, 33(2): 025010
doi: 10.1088/1674-4926/33/2/025010
Digital post-calibration of a 5-bit 1.25 GS/s flash ADC
J. Semicond. 2012, 33(2): 025011
doi: 10.1088/1674-4926/33/2/025011
A 14-bit 80 MS/s CMOS ADC with 84.8 dB SFDR and 72 dB SNDR
J. Semicond. 2012, 33(2): 025012
doi: 10.1088/1674-4926/33/2/025012
A low-power high-speed driving circuit for spatial light modulators
J. Semicond. 2012, 33(2): 025013
doi: 10.1088/1674-4926/33/2/025013
A sub-1 V high-precision CMOS bandgap voltage reference
J. Semicond. 2012, 33(2): 025014
doi: 10.1088/1674-4926/33/2/025014
Design for manufacturability of a VDSM standard cell library
J. Semicond. 2012, 33(2): 025015
doi: 10.1088/1674-4926/33/2/025015
Highly controllable ICP etching of GaAs based materials for grating fabrication
J. Semicond. 2012, 33(2): 026001
doi: 10.1088/1674-4926/33/2/026001