适用于超深亚微米光刻仿真的建模和优化

Shen Shanhu, Shi Zheng, Xie Chunlei, Yan Xiaolang

key words: lithography modeling, layout contour, circular sampling, genetic algorithm, optical proximity correction

A new algorithm of inverse lithography technology for mask complexity reduction

Li Yanghuan, Shi Zheng, Geng Zhen, Yang Yiwei, Yan Xiaolang

doi: 10.1088/1674-4926/33/4/045009

key words: inverse lithography technology, mask complexity, complexity penalty term, wavelet penalty

基于光刻模型的动态自适应切分OPC

Yang Yiwei, Shi Zheng, Yan Xiaolang

key words: OPC, DFM, Dissection, lithography modeling

Seamless-merging-oriented parallel inverse lithography technology

Yang Yiwei, Shi Zheng, Shen Shanhu

doi: 10.1088/1674-4926/30/10/106002

key words: lithography