适用于超深亚微米光刻仿真的建模和优化

Shen Shanhu, Shi Zheng, Xie Chunlei, Yan Xiaolang

key words: lithography modeling, layout contour, circular sampling, genetic algorithm, optical proximity correction

Seamless-merging-oriented parallel inverse lithography technology

Yang Yiwei, Shi Zheng, Shen Shanhu

doi: 10.1088/1674-4926/30/10/106002

key words: lithography