The etching process and mechanism analysis of Ta-Sb₂Te₃ film based on inductively coupled plasma

Yongkang Xu, Sannian Song, Wencheng Fang, Chengxing Li, Zhitang Song

doi: 10.1088/1674-4926/41/12/122103

key words: new phase change material, inductively couple plasma, etching process, etching characteristics, mechanism