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Design and fabrication of an embedded wire-grid nanograting

Zhou Libing and Zhu Wei

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Abstract: An embedded wire-grid nanograting was designed and fabricated for using as a broadband polarizing beam splitter to reflect s-polarized light and transmit p-polarized light. A protected cladding layer of the same material as the grating’s was deposited on the ridge, whereas the wire-grid is deposited in the grating trenches, which makes it more firm during application. High polarization extinction ratios of above 40 and 20 dB for transmission and reflection, respectively, with a broad wavelength range for the whole optical communication bandwidth (850-1700 nm) and a wide angular tolerance (>±20°) are obtained by optimization of the designed structures, and the grating period is 200 nm.

Key words: polarizing beam splitter wire-grid nanograting extinction ratio

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    Received: 18 August 2015 Revised: Online: Published: 01 January 2009

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      Zhou Libing, Zhu Wei. Design and fabrication of an embedded wire-grid nanograting[J]. Journal of Semiconductors, 2009, 30(1): 014006. doi: 10.1088/1674-4926/30/1/014006 Zhou L B, Zhu W. Design and fabrication of an embedded wire-grid nanograting[J]. J. Semicond., 2009, 30(1): 014006. doi:  10.1088/1674-4926/30/1/014006.Export: BibTex EndNote
      Citation:
      Zhou Libing, Zhu Wei. Design and fabrication of an embedded wire-grid nanograting[J]. Journal of Semiconductors, 2009, 30(1): 014006. doi: 10.1088/1674-4926/30/1/014006

      Zhou L B, Zhu W. Design and fabrication of an embedded wire-grid nanograting[J]. J. Semicond., 2009, 30(1): 014006. doi:  10.1088/1674-4926/30/1/014006.
      Export: BibTex EndNote

      Design and fabrication of an embedded wire-grid nanograting

      doi: 10.1088/1674-4926/30/1/014006
      • Received Date: 2015-08-18

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