SEMICONDUCTOR MATERIALS

A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process

Zhang Han and Li Weihua

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Abstract: Detailed characteristics of three classical rectangular convex corner compensation structures on (100) silicon substrates have been investigated, and their common design steps are summarized. By combining the basic method of a silicon wet anisotropic etching process, a general method of generating compensation structures for a rectangular convex corner is put forward. This calls for the following two steps: define the topological field and fit some borderlines together into practical compensation patterns. The rules, which must be obeyed during this process, are summarized. By introducing this method, some novel compensation patterns for rectangular convex corner structures are created on both (100) and (110) substrates, and finally simulation results are given to prove this new method's validity and applicability.

Key words: rectangular convex corner compensation

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    Received: 18 August 2015 Revised: 24 February 2009 Online: Published: 01 July 2009

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      Zhang Han, Li Weihua. A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process[J]. Journal of Semiconductors, 2009, 30(7): 073003. doi: 10.1088/1674-4926/30/7/073003 Zhang H, Li W H. A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process[J]. J. Semicond., 2009, 30(7): 073003. doi: 10.1088/1674-4926/30/7/073003.Export: BibTex EndNote
      Citation:
      Zhang Han, Li Weihua. A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process[J]. Journal of Semiconductors, 2009, 30(7): 073003. doi: 10.1088/1674-4926/30/7/073003

      Zhang H, Li W H. A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process[J]. J. Semicond., 2009, 30(7): 073003. doi: 10.1088/1674-4926/30/7/073003.
      Export: BibTex EndNote

      A novel method for generating a rectangular convex corner compensation structure in an anisotropic etching process

      doi: 10.1088/1674-4926/30/7/073003
      • Received Date: 2015-08-18
      • Accepted Date: 2009-01-15
      • Revised Date: 2009-02-24
      • Published Date: 2009-07-10

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