| Citation: |
Wang Cailing, Kang Renke, Jin Zhuji, Guo Dongming. Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP[J]. Journal of Semiconductors, 2010, 31(12): 126001. doi: 10.1088/1674-4926/31/12/126001
Wang C L, Kang R K, Jin Z J, Guo D M. Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP[J]. J. Semicond., 2010, 31(12): 126001. doi: 10.1088/1674-4926/31/12/126001.
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Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP
doi: 10.1088/1674-4926/31/12/126001
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Abstract
Based on the Preston equation, the mathematical model of the material removal rate (MRR), aiming at a line-orbit chemical mechanical polisher, is established. The MRR and the material removal non-uniformity (MRNU) are numerically calculated by MATLAB, and the effects of the reciprocating parameters on the MRR and the MRNU are discussed. It is shown that the smaller the inclination angle and the larger the amplitude, the higher the MRR and the lower the MRNU. The reciprocating speed of the carrier plays a minor role to improve the MRR and decrease the MRNU. The results provide a guide for the design of a polisher and the determination of a process in line-orbit chemical mechanical polishing. -
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