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Dependence of transient performance on potential distribution in a static induction thyristor channel

Liu Chunjuan, Liu Su and Bai Yajie

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Abstract: The impact of potential barrier distribution on the transient performance of a static induction thyristor (SITH) in a channel determined by geometrical parameters and applied bias voltage is studied theoretically and experimentally. The analytical expressions of potential barrier height and the I-V characteristics of the SITH are also derived. The main factors that influence the transient performance of the SITH between the blocking and conducting states, as well as the mechanism underlying the transient process, is thoroughly investigated. This is useful in designing, fabricating, optimizing and applying SITHs properly.

Key words: static induction thyristorpotential barriertransient performanceblocking stateconducting state

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    Received: 20 August 2015 Revised: 22 November 2011 Online: Published: 01 April 2012

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      Liu Chunjuan, Liu Su, Bai Yajie. Dependence of transient performance on potential distribution in a static induction thyristor channel[J]. Journal of Semiconductors, 2012, 33(4): 044009. doi: 10.1088/1674-4926/33/4/044009 Liu C J, Liu S, Bai Y J. Dependence of transient performance on potential distribution in a static induction thyristor channel[J]. J. Semicond., 2012, 33(4): 044009. doi: 10.1088/1674-4926/33/4/044009.Export: BibTex EndNote
      Citation:
      Liu Chunjuan, Liu Su, Bai Yajie. Dependence of transient performance on potential distribution in a static induction thyristor channel[J]. Journal of Semiconductors, 2012, 33(4): 044009. doi: 10.1088/1674-4926/33/4/044009

      Liu C J, Liu S, Bai Y J. Dependence of transient performance on potential distribution in a static induction thyristor channel[J]. J. Semicond., 2012, 33(4): 044009. doi: 10.1088/1674-4926/33/4/044009.
      Export: BibTex EndNote

      Dependence of transient performance on potential distribution in a static induction thyristor channel

      doi: 10.1088/1674-4926/33/4/044009
      • Received Date: 2015-08-20
      • Accepted Date: 2011-10-21
      • Revised Date: 2011-11-22
      • Published Date: 2012-03-23

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