SEMICONDUCTOR DEVICES

Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices

Weikang Wu, Xia An, Fei Tan, Hui Feng, Yehua Chen, Jingjing Liu, Xing Zhang and Ru Huang

+ Author Affiliations

 Corresponding author: An Xia, Email: anxia@ime.pku.edu.cn; Huang Ru, Email: ruhuang@pku.edu.cn

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Abstract: The effects of the physical damages induced by heavy ion irradiation on the performance of partially-depleted SOI devices are experimentally investigated. After heavy ion exposure, different degradation phenomena are observed due to the random strike of heavy ions. A decrease of the saturation current and transconductance, and an enhanced gate-induced drain leakage current are observed, which are mainly attributed to the displacement damages that may be located in the channel, the depletion region of the drain/body junction or the gate-to-drain overlap region. Further, PDSOI devices with and without body contact are compared, which reveals the differences in the threshold voltage shift, the drain-induced barrier lowing effect, the transconductance and the kink effect. The results may provide a guideline for radiation hardened design.

Key words: heavy iondisplacement damagesPDSOIperformance degradation



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Fig. 1.  (Color online) The electrical characteristics of BC-PDSOI device before and after heavy ion exposure. (a) Output characteristics. (b) Transfer characteristics. (c) Transconductance.

Fig. 2.  (Color online) The electrical characteristics of BC-PDSOI device before and after heavy ion exposure. (a) Transfer characteristics. (b) Output characteristics.

Fig. 3.  (Color online) The source current of BC-PDSOI device before and after heavy ion exposure.

Fig. 4.  (Color online) The drain and body current of BC-PDSOI device before and after heavy ion exposure.

Fig. 5.  (Color online) The electrical characteristics of BC-PDSOI device before and after heavy ion exposure. (a) Transfer characteristics. (b) Output characteristics.

Fig. 6.  (a) Cross-section of a BC-PDSOI devices. (b) Energy band diagram at gate-to-drain overlap region.

Fig. 7.  Color online) The electrical characteristics of BC-PDSOI device before and after heavy ion exposure. (a) Transfer characteristics. (b) Output characteristics. (c) Output resistance.

Fig. 8.  Comparison of BC-PDSOI devices and FB-PDSOI devices. (a) Shift of threshold voltage. (b) DIBL effect. (c) Degradation of maximum transconductance.

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    Received: 11 June 2015 Revised: Online: Published: 01 November 2015

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      Weikang Wu, Xia An, Fei Tan, Hui Feng, Yehua Chen, Jingjing Liu, Xing Zhang, Ru Huang. Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices[J]. Journal of Semiconductors, 2015, 36(11): 114004. doi: 10.1088/1674-4926/36/11/114004 W K Wu, X An, F Tan, H Feng, Y H Chen, J J Liu, X Zhang, R Huang. Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices[J]. J. Semicond., 2015, 36(11): 114004. doi: 10.1088/1674-4926/36/11/114004.Export: BibTex EndNote
      Citation:
      Weikang Wu, Xia An, Fei Tan, Hui Feng, Yehua Chen, Jingjing Liu, Xing Zhang, Ru Huang. Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices[J]. Journal of Semiconductors, 2015, 36(11): 114004. doi: 10.1088/1674-4926/36/11/114004

      W K Wu, X An, F Tan, H Feng, Y H Chen, J J Liu, X Zhang, R Huang. Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices[J]. J. Semicond., 2015, 36(11): 114004. doi: 10.1088/1674-4926/36/11/114004.
      Export: BibTex EndNote

      Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices

      doi: 10.1088/1674-4926/36/11/114004
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      • Corresponding author: An Xia, Email: anxia@ime.pku.edu.cn; Huang Ru, Email: ruhuang@pku.edu.cn
      • Received Date: 2015-06-11
      • Accepted Date: 2015-07-06
      • Published Date: 2015-01-25

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