SEMICONDUCTOR DEVICES

Thin silicon layer SOI power device with linearly-distance fixed charge islands

Yuan Zuo1, Haiou Li1, Jianghui Zhai1, Ning Tang1, Shuxiang Song3 and Qi Li1, 2,

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 Corresponding author: Qi Li, E-mail: lqmoon@guet.edu.cn

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Abstract: A new high-voltage LDMOS with linearly-distanced fixed charge islands is proposed (LFI LDMOS). A lot of linearly-distanced fixed charge islands are introduced by implanting the Cs or I ion into the buried oxide layer and dynamic holes are attracted and accumulated, which is crucial to enhance the electric field of the buried oxide and the vertical breakdown voltage. The surface electric field is improved by increasing the distance between two adjacent fixed charge islands from source to drain, which lead to the higher concentration of the drift region and a lower on-resistance. The numerical results indicate that the breakdown voltage of 500 V with Ld = 45 μm is obtained in the proposed device in comparison to 209 V of conventional LDMOS, while maintaining low on-resistance.

Key words: linearly-distancedfixed charge islandbreakdown voltagedynamic holeson-resistance



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Fig. 1.  (a) Cross-section of LFI LDMOS. (b) Processes of fixed charge islands.

Fig. 2.  (Color online) (a) Equipotential distribution of LFI LDMOS. (b) Equipotential distribution of conventional LDMOS. (c) Dynamic electrons distribution on the bottom interface of the buried oxide. (d) Dynamic holes distribution on the top interface of the buried oxide. (e) Surface electric field distribution. (f) Vertical electric field distribution under the drain.

Fig. 3.  (a) Breakdown voltage and on-resistance as a function of $N_{\rm d}$. (b) The BV as a function of on-resistance.

Fig. 4.  Influence of $\Delta D$ on (a) BV and (b) optimal $N_{\rm d}$.

Fig. 5.  Breakdown voltage as a function of (a) $N_{\rm d}$ and $N_{\rm p}$, (b) $N_{\rm d}$ and $D$, (c) $\sigma_{\rm f}$ and BV, and (d) $N_{\rm d}$ and $t_{\rm d}$.

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    Received: 11 October 2014 Revised: Online: Published: 01 May 2015

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      Yuan Zuo, Haiou Li, Jianghui Zhai, Ning Tang, Shuxiang Song, Qi Li. Thin silicon layer SOI power device with linearly-distance fixed charge islands[J]. Journal of Semiconductors, 2015, 36(5): 054005. doi: 10.1088/1674-4926/36/5/054005 Y Zuo, H O Li, J H Zhai, N Tang, S X Song, Q Li. Thin silicon layer SOI power device with linearly-distance fixed charge islands[J]. J. Semicond., 2015, 36(5): 054005. doi: 10.1088/1674-4926/36/5/054005.Export: BibTex EndNote
      Citation:
      Yuan Zuo, Haiou Li, Jianghui Zhai, Ning Tang, Shuxiang Song, Qi Li. Thin silicon layer SOI power device with linearly-distance fixed charge islands[J]. Journal of Semiconductors, 2015, 36(5): 054005. doi: 10.1088/1674-4926/36/5/054005

      Y Zuo, H O Li, J H Zhai, N Tang, S X Song, Q Li. Thin silicon layer SOI power device with linearly-distance fixed charge islands[J]. J. Semicond., 2015, 36(5): 054005. doi: 10.1088/1674-4926/36/5/054005.
      Export: BibTex EndNote

      Thin silicon layer SOI power device with linearly-distance fixed charge islands

      doi: 10.1088/1674-4926/36/5/054005
      Funds:

      Project supported by the Guangxi Natural Science Foundation of China (No.2013GXNSFAA019335), the Guangxi Department of Education Project (No.201202ZD041), the China Postdoctoral Science Foundation Project (Nos.2012M521127, 2013T60566), and the National Natural Science Foundation of China (Nos.61361011, 61274077, 61464003).

      More Information
      • Corresponding author: E-mail: lqmoon@guet.edu.cn
      • Received Date: 2014-10-11
      • Accepted Date: 2014-12-15
      • Published Date: 2015-01-25

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