Chin. J. Semicond. > 2003, Volume 24 > Issue S1 > 148-152

Device Simulation for Nanoscale MOSFET

Liu Xiaoyan, Liu Enfeng, Du Gang, Liu Yibo, Xia Zhiliang and Han Ruqi

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Abstract: A novel scheme for incorporating quantum effect in classical hydrodynamic model is proposed. No additional Equations are needed to solve quantum potential with this scheme, so the complexity ofEquations is largely reduced. Based on this, a HD simulation program is developed. The 25nm gate length MOSFET and 30nm FinFET are simulated.

Key words: nano-scale semiconductor device simulation hydrodynamic model quantum effect

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    Received: 16 March 2016 Revised: Online: Published: 01 January 2003

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      Liu Xiaoyan, Liu Enfeng, Du Gang, Liu Yibo, Xia Zhiliang, Han Ruqi. Device Simulation for Nanoscale MOSFET[J]. Journal of Semiconductors, 2003, In Press. Liu X Y, Liu E F, Du G, Liu Y B, Xia Z L, Han R Q. Device Simulation for Nanoscale MOSFET[J]. Chin. J. Semicond., 2003, 24(S1): 148.Export: BibTex EndNote
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      Liu Xiaoyan, Liu Enfeng, Du Gang, Liu Yibo, Xia Zhiliang, Han Ruqi. Device Simulation for Nanoscale MOSFET[J]. Journal of Semiconductors, 2003, In Press.

      Liu X Y, Liu E F, Du G, Liu Y B, Xia Z L, Han R Q. Device Simulation for Nanoscale MOSFET[J]. Chin. J. Semicond., 2003, 24(S1): 148.
      Export: BibTex EndNote

      Device Simulation for Nanoscale MOSFET

      • Received Date: 2016-03-16
      • Published Date: 2016-03-15

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