Abstract: Overlapped increment scanning in electron beam lithography and the calculation methods for the exposure doses and the etching depth and sensitivity are presented for the structural characteristics of three-dimensional patterns as well as the self-devised pattern generator of an e-beam lithography system.Based on the calculated dose relations according to the scanning mode,the exposure experiments are conducted in an SDS-3 e-beam lithography system.After the development,the distinct three-dimensional structures of the conic of trapezoid 1 and the conic are obtained.Overlapped increment scanning therefore can be used for three-dimensional fabrication,and the calculation of the relations between exposure doses and the etching depth and sensitivity can provide the practical parameters for it.

Key words: DSP, pattern generator, e-beam lithography, three-dimensional lithography, sensitivity