Chin. J. Semicond. > 2001, Volume 22 > Issue 12 > 1534-1537

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高能铒离子注入硅单晶的辐射损伤及其退火行为

李玉国 and 薛成山

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Key words: 高能离子注入, 损伤分布, 退火

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    History

    Received: 20 August 2015 Revised: Online: Published: 01 December 2001

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      • Received Date: 2015-08-20

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