Chin. J. Semicond. > 2005, Volume 26 > Issue 1 > 96-101

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Abstract: 提出一种新结构的微波功率SiGe异质结双极晶体管(SiGe HBT),该结构通过在传统SiGe HBT的外基区下的集电区中挖槽并填充SiO2的方法来改善器件的高频性能.将相同尺寸的新结构和传统结构的器件仿真结果进行比较,发现新结构器件的基区集电区电容减少了55%,因而使器件的最大有效增益提高了大约2dB,其工作在低压(Vce=4.5V)和高压(Vce=28V)情况下的最高振荡频率分别提高了24%和10%.

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2005

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      新结构微波功率SiGe HBT的数值分析[J]. Journal of Semiconductors, 2005, In Press. 新结构微波功率SiGe HBT的数值分析[J]. Chin. J. Semicond., 2005, 26(1): 96.Export: BibTex EndNote
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      新结构微波功率SiGe HBT的数值分析[J]. Journal of Semiconductors, 2005, In Press.

      新结构微波功率SiGe HBT的数值分析[J]. Chin. J. Semicond., 2005, 26(1): 96.
      Export: BibTex EndNote

      新结构微波功率SiGe HBT的数值分析

      • Received Date: 2015-08-19

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