Chin. J. Semicond. > 2003, Volume 24 > Issue S1 > 74-77
|

Surface and Interface Characteristic of Sputtered Nanometer PtSi Film

Yin Jinghua, Cai Wei, Wang Mingguang, Zheng Yufeng, Li Meicheng, Wang Peilin and Zhao Liancheng

+ Author Affiliations

PDF

Abstract: The 5nm Pt films are deposited on p-Si (111) substrate by magnetron sputtering. After annealing, Pt films turn into PtSi. The characteristic of surface and interface of Ptsi films are studied by AFM and -RTEM. The results show that the technology conditions influence the interface structure and surface morphology of Ptsi films. With an increase of substrate temperature, the columnar clusters on the surface become into the flat ones, and multi-layer films to be the single ones. If the substrate are heated, there are only PtSi phase in the single layer film that is uniform and sound and has a smooth, clear and coherent interface.

Key words: PtSi film,  surface morphology,  interface structure

    • Search

    Advanced Search >>

    Article Metrics

    Article views: 1962 Times PDF downloads: 534 Times Cited by: 0 Times

    History

    Received: 16 March 2016 Revised: Online: Published: 01 January 2003

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2003  >  24(S1): 74-77
      Yin Jinghua, Cai Wei, Wang Mingguang, Zheng Yufeng, Li Meicheng, Wang Peilin, Zhao Liancheng. Surface and Interface Characteristic of Sputtered Nanometer PtSi Film[J]. Journal of Semiconductors, 2003, In Press. Yin J H, Cai W, Wang M G, Zheng Y F, Li M C, Wang P L, Zhao L C. Surface and Interface Characteristic of Sputtered Nanometer PtSi Film[J]. Chin. J. Semicond., 2003, 24(S1): 74.Export: BibTex EndNote
      Citation:
      Yin Jinghua, Cai Wei, Wang Mingguang, Zheng Yufeng, Li Meicheng, Wang Peilin, Zhao Liancheng. Surface and Interface Characteristic of Sputtered Nanometer PtSi Film[J]. Journal of Semiconductors, 2003, In Press.

      Yin J H, Cai W, Wang M G, Zheng Y F, Li M C, Wang P L, Zhao L C. Surface and Interface Characteristic of Sputtered Nanometer PtSi Film[J]. Chin. J. Semicond., 2003, 24(S1): 74.
      Export: BibTex EndNote
      shu

      Surface and Interface Characteristic of Sputtered Nanometer PtSi Film

      • School ofapplied Science, Harbin University of Science and Technology, Harbin 150080, China,School of Matelials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China,Laboratory ofatomic Imaging of Solid, Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110015, China,School of Matelials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China,School of Matelials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China,School of Matelials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China and School of Matelials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China

      • Received Date: 2016-03-16
      • Published Date: 2016-03-15

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return