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Fabrication of a High-Performance Solenoid Microinductor

Fang Dongming, Zhou Yong and Zhao Xiaolin

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Abstract: A high-performance RF solenoid microinductor is fabricated using microelectromechanical systems technology.This inductor employs an electroplated copper coil to reduce the series resistance,and its total area is 880μm×350μm,which saves chip area significantly compared with planar microinductors.The measurement results show that this inductor has a high Q-factor over a wide range of operating frequencies.The maximum Q-factor of this inductor is 38 and the inductance is 1.82nH at 6GHz.

Key words: solenoid inductorRF MEMSquality factorthree-dimension

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    Received: 18 August 2015 Revised: 12 February 2006 Online: Published: 01 August 2006

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      Fang Dongming, Zhou Yong, Zhao Xiaolin. Fabrication of a High-Performance Solenoid Microinductor[J]. Journal of Semiconductors, 2006, In Press. Fang D M, Zhou Y, Zhao X L. Fabrication of a High-Performance Solenoid Microinductor[J]. Chin. J. Semicond., 2006, 27(8): 1422.Export: BibTex EndNote
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      Fang Dongming, Zhou Yong, Zhao Xiaolin. Fabrication of a High-Performance Solenoid Microinductor[J]. Journal of Semiconductors, 2006, In Press.

      Fang D M, Zhou Y, Zhao X L. Fabrication of a High-Performance Solenoid Microinductor[J]. Chin. J. Semicond., 2006, 27(8): 1422.
      Export: BibTex EndNote

      Fabrication of a High-Performance Solenoid Microinductor

      • Received Date: 2015-08-18
      • Accepted Date: 2006-01-06
      • Revised Date: 2006-02-12
      • Published Date: 2006-10-12

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