Chin. J. Semicond. > 2006, Volume 27 > Issue 7 > 1331-1334

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A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces

Ku Liming, Wang Jing and Zhou Qigang

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Abstract: The microroughness of silicon surfaces after pre-oxidation cleaning is studied using atomic force microscopy,and the cleaning mechanism is analyzed by building surface reaction and oxide layer models.The experimental results show that the oxide layer on a wafer’s the surface can eliminate the anisotropic etching in the ammonia solution.The RMS roughness of the surface is less than that obtained using the traditional RCA process,and it decreases with the increase of ammonia concentration after forming an oxide layer prior to RCA cleaning.

Key words: pre-oxidation oxide layeranisotropic etchingmicroroughness

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    Received: 20 August 2015 Revised: Online: Published: 01 July 2006

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      Ku Liming, Wang Jing, Zhou Qigang. A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces[J]. Journal of Semiconductors, 2006, In Press. Ku L M, Wang J, Zhou Q G. A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces[J]. Chin. J. Semicond., 2006, 27(7): 1331.Export: BibTex EndNote
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      Ku Liming, Wang Jing, Zhou Qigang. A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces[J]. Journal of Semiconductors, 2006, In Press.

      Ku L M, Wang J, Zhou Q G. A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces[J]. Chin. J. Semicond., 2006, 27(7): 1331.
      Export: BibTex EndNote

      A Pre-Oxidation Cleaning Process to Decrease the Microroughess of Si Wafer Surfaces

      • Received Date: 2015-08-20

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