Chin. J. Semicond. > 1992, Volume 13 > Issue 6 > 386-391

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PECVD SiON膜的性质及其在双层互连工艺中的应用

曾天亮 , 陈平 , 江志庚 and 李志彭

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    Received: 19 August 2015 Revised: Online: Published: 01 June 1992

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      Article Navigation >  Journal of Semiconductors  > 1992  >  13(6): 386-391
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      • Received Date: 2015-08-19

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