Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 857-861
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CONTENTS

A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates

Yang , Rong，Li , Junfeng，Zhao , Yuyin，Chai , Shumin，Han , Zhengsheng，and , Qian and He

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Key words: silicon, inductor, structure, process, quality factor, self-resonant frequency

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(5): 857-861
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      • Received Date: 2015-08-19

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