Chin. J. Semicond. > 2007, Volume 28 > Issue S1 > 238-240

Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers

Yu Guanghui, Lei Benliang, Meng Sheng, Wang Xinzhong, Lin Chaotong and Qi Ming

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Abstract: Thick GaN films are grown by hydride vapor phase epitaxy with low temperature AIN interlayers(LT·AlN). Influence of annealing time of LT-AlN on the crystalline quality of GaN films is studied.Surface morphology of LT-AlN layers changes after annealing.Crystalline quality can be improved with a suitable LT-AlN annealing time.

Key words: GaNhydride vapor phase epitaxylow temperature AIN interlayer

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    Received: 27 May 2016 Revised: Online: Published: 01 January 2007

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      Yu Guanghui, Lei Benliang, Meng Sheng, Wang Xinzhong, Lin Chaotong, Qi Ming. Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers[J]. Journal of Semiconductors, 2007, In Press. Yu G H, Lei B L, Meng S, Wang X Z, Lin C T, Qi M. Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers[J]. Chin. J. Semicond., 2007, 28(S1): 238.Export: BibTex EndNote
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      Yu Guanghui, Lei Benliang, Meng Sheng, Wang Xinzhong, Lin Chaotong, Qi Ming. Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers[J]. Journal of Semiconductors, 2007, In Press.

      Yu G H, Lei B L, Meng S, Wang X Z, Lin C T, Qi M. Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers[J]. Chin. J. Semicond., 2007, 28(S1): 238.
      Export: BibTex EndNote

      Hydride Vapor Phase Epitaxy of Thick GaN with Low Temperature AIN Interlayers

      • Received Date: 2016-05-27
      • Published Date: 2016-04-28

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