J. Semicond. > 2008, Volume 29 > Issue 10 > 1932-1938

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A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation

Wang Jiachou, Rong Weibin, Sun Lining and Li Xinxin

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Abstract: An integrated micro positioningxy-stage with a 2mm×2mm-area shuttle is fabricated for application in nano-meter-scale operation and nanometric positioning precision.It is mainly composed of a silicon-based xy-stage,electrostatics comb actuator,and a displacement sensor based on a vertical sidewall surface piezoresistor.They are all in a monolithic chip and developed using double-sided bulk-micromachining technology.The high-aspect-ratio comb-driven xy-stage is achieved by deep reactive ion etching (DRIE) in both sides of the wafer.The detecting piezoresistor is located at the vertical sidewall surface of the detecting beam to improve the sensitivity and displacement resolution of the piezoresistive sensors using the DRIE technology combined with the ion implantation technology.The experimental results verify the integrated micro positioning xy-stage design including the micro xy-stage,electrostatics comb actuator,and the vertical sidewall surface piezoresistor technique.The sensitivity of the fabricated piezoresistive sensors is better than 1.17mV/μm without amplification and the linearity is better than 0.814%.Under 30V driving voltage,a ±10μm single-axis displacement is measured without crosstalk and the resonant frequency is measured at 983Hz in air.

Key words: MEMSintegrated micro xy-stageelectrostatics comb actuatorvertical sidewall surface piezoresistor in plane

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    Received: 18 August 2015 Revised: 19 June 2008 Online: Published: 01 October 2008

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      Wang Jiachou, Rong Weibin, Sun Lining, Li Xinxin. A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation[J]. Journal of Semiconductors, 2008, In Press. Wang J C, Rong W B, Sun L N, Li X X. A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation[J]. J. Semicond., 2008, 29(10): 1932.Export: BibTex EndNote
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      Wang Jiachou, Rong Weibin, Sun Lining, Li Xinxin. A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation[J]. Journal of Semiconductors, 2008, In Press.

      Wang J C, Rong W B, Sun L N, Li X X. A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation[J]. J. Semicond., 2008, 29(10): 1932.
      Export: BibTex EndNote

      A Silicon Integrated Micro Positioning xy-Stage for Nano-Manipulation

      • Received Date: 2015-08-18
      • Accepted Date: 2008-05-12
      • Revised Date: 2008-06-19
      • Published Date: 2008-11-11

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