Chin. J. Semicond. > 2005, Volume 26 > Issue 1 > 34-37
|

CONTENTS

非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征

胡志华 and 廖显伯

+ Author Affiliations

PDF

Abstract: 报道了一种用透射谱数据分析法计算非晶硅碳薄膜的厚度、折射率、吸收系数和光学带隙等光学常数的方法和程序．这一方法引用有效谐振子模型理论的折射率色散关系，所有公式均为解析表达式，便于进行数据处理，无须专用软件，使用Excel即可完成，适用于多种半导体薄膜材料．将这种方法应用于PECVD方法制备的非晶硅碳（a-SiC∶H）薄膜，对其光学特性进行了分析．

    • Search

    Advanced Search >>

    Article Metrics

    Article views: 3077 Times PDF downloads: 2049 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 January 2005

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2005  >  26(1): 34-37
      非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, In Press. 非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征[J]. Chin. J. Semicond., 2005, 26(1): 34.Export: BibTex EndNote
      Citation:
      非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, In Press.

      非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征[J]. Chin. J. Semicond., 2005, 26(1): 34.
      Export: BibTex EndNote
      shu

      非晶硅碳（a-SiC∶H）薄膜光学常数的透射谱表征

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return