Chin. J. Semicond. > 1989, Volume 10 > Issue 10 > 775-780
|

CONTENTS

大功率晶体管刻槽与钝化工艺研究

万积庆 and 廖晓华

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    Article Metrics

    Article views: 2551 Times PDF downloads: 846 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 October 1989

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1989  >  10(10): 775-780
      Export: BibTex EndNote
      Citation:


      Export: BibTex EndNote
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return