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Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing

Zeng Yugang, Han Genquan and Yu Jinzhong

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Abstract: Ge self-assembled quantum dots (SAQDs) are grown with a self-assembled UHV/CVD epitaxy system.Then,the as-grown Ge quantum dots are annealed by ArF excimer laser.In the ultra-shot laser pulse duration,~20ns,bulk diffusion is forbidden,and only surface diffusion occurs,resulting in a laser induced quantum dot (LIQD).The diameter of the LIQD is 20~25nm which is much smaller than the as-grown dot and the LIQD has a higher density of about 6E10cm-2.The surface morphology evolution is investigated by AFM.

Key words: Ge quantum dotArF excimer laser annealingLIQDAFM

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    Received: 18 August 2015 Revised: 23 November 2007 Online: Published: 01 April 2008

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      Zeng Yugang, Han Genquan, Yu Jinzhong. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. Journal of Semiconductors, 2008, In Press. Zeng Y G, Han G Q, Yu J Z. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. J. Semicond., 2008, 29(4): 641.Export: BibTex EndNote
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      Zeng Yugang, Han Genquan, Yu Jinzhong. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. Journal of Semiconductors, 2008, In Press.

      Zeng Y G, Han G Q, Yu J Z. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. J. Semicond., 2008, 29(4): 641.
      Export: BibTex EndNote

      Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing

      • Received Date: 2015-08-18
      • Accepted Date: 2007-11-07
      • Revised Date: 2007-11-23
      • Published Date: 2008-04-03

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