Chin. J. Semicond. > 2005, Volume 26 > Issue 3 > 532-535

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Abstract: 通过实验成功得到了0.1μm槽栅结构CMOS器件,验证了理论结果的正确性,表明这是一种优良的小尺寸器件结构.该槽栅器件具有阈值电压漂移较小及较好抑制短沟道效应的特点,并分析了目前器件驱动电流较小的原因及解决办法.

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2005

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      0.1μm槽栅CMOS器件及相关特性[J]. Journal of Semiconductors, 2005, In Press. 0.1μm槽栅CMOS器件及相关特性[J]. Chin. J. Semicond., 2005, 26(3): 532.Export: BibTex EndNote
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      0.1μm槽栅CMOS器件及相关特性[J]. Journal of Semiconductors, 2005, In Press.

      0.1μm槽栅CMOS器件及相关特性[J]. Chin. J. Semicond., 2005, 26(3): 532.
      Export: BibTex EndNote

      0.1μm槽栅CMOS器件及相关特性

      • Received Date: 2015-08-19

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