Chin. J. Semicond. > 2006, Volume 27 > Issue 5 > 819-823

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Method of Verification for Manufacturing in Sub-Wavelength Design

Wang Guoxiong and Yan Xiaolang

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Abstract: We describe a post resolution-enhancement-technique verification method for use in manufacturing data flow.The goal of the method is to verify whether designs function as intended,or more precisely,whether the printed images are consistent with the design intent.The process modeling is described for the model-based verification method.The performance of the method is demonstrated by experiment

Key words: verification for manufacturingresolution enhancement techniqueoptical proximity correction

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    Received: 20 August 2015 Revised: Online: Published: 01 May 2006

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      Wang Guoxiong, Yan Xiaolang. Method of Verification for Manufacturing in Sub-Wavelength Design[J]. Journal of Semiconductors, 2006, In Press. Wang G X, Yan X L. Method of Verification for Manufacturing in Sub-Wavelength Design[J]. Chin. J. Semicond., 2006, 27(5): 819.Export: BibTex EndNote
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      Wang Guoxiong, Yan Xiaolang. Method of Verification for Manufacturing in Sub-Wavelength Design[J]. Journal of Semiconductors, 2006, In Press.

      Wang G X, Yan X L. Method of Verification for Manufacturing in Sub-Wavelength Design[J]. Chin. J. Semicond., 2006, 27(5): 819.
      Export: BibTex EndNote

      Method of Verification for Manufacturing in Sub-Wavelength Design

      • Received Date: 2015-08-20

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