Chin. J. Semicond. > 1990, Volume 11 > Issue 12 > 954-957

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反应溅射法制备掺硼的a—Si:H(B)薄膜的ESR研究

陈光华 , 徐进章 and 张仿清

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1990

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      • Received Date: 2015-08-19

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