Chin. J. Semicond. > 2007, Volume 28 > Issue S1 > 182-185

Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.

Qi Ming, Xu Anhuai, Ai Likun, Sun Hao and Zhu Fuying

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Abstract: Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically.High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.

Key words: InPInGaP,GaAsGSMBE,HBTGSMBE HBT

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    Received: 27 May 2016 Revised: Online: Published: 01 January 2007

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      Qi Ming, Xu Anhuai, Ai Likun, Sun Hao, Zhu Fuying. Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs byGSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.[J]. Journal of Semiconductors, 2007, In Press. Qi M, Xu A H, Ai L K, Sun H, Zhu F Y. Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs byGSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.[J]. Chin. J. Semicond., 2007, 28(S1): 182.Export: BibTex EndNote
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      Qi Ming, Xu Anhuai, Ai Likun, Sun Hao, Zhu Fuying. Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.[J]. Journal of Semiconductors, 2007, In Press.

      Qi M, Xu A H, Ai L K, Sun H, Zhu F Y. Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs byGSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.[J]. Chin. J. Semicond., 2007, 28(S1): 182.
      Export: BibTex EndNote

      Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.

      • Received Date: 2016-05-27
      • Published Date: 2016-04-28

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