Chin. J. Semicond. > 2005, Volume 26 > Issue 3 > 601-605

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Abstract: 提出了一种新的优化的基于模型的光学邻近矫正算法,该算法充分考虑了图形内部及图形之间的光学邻近影响,实现了线段切割和移动步长的自适应性,提高了系统的矫正精度及矫正速度,实验结果表明该算法是有效的.

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2005

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      优化的基于模型的光学邻近矫正算[J]. Journal of Semiconductors, 2005, In Press. 优化的基于模型的光学邻近矫正算[J]. Chin. J. Semicond., 2005, 26(3): 601.Export: BibTex EndNote
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      优化的基于模型的光学邻近矫正算[J]. Journal of Semiconductors, 2005, In Press.

      优化的基于模型的光学邻近矫正算[J]. Chin. J. Semicond., 2005, 26(3): 601.
      Export: BibTex EndNote

      优化的基于模型的光学邻近矫正算

      • Received Date: 2015-08-19

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