Chin. J. Semicond. > 2004, Volume 25 > Issue 10 > 1193-1204

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HfO_2 Gate Dielectrics for Future Generation of CMOS Device Application

H Y Yu , J F Kang , Ren Chi , M F Li and D L Kwong

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    Received: 19 August 2015 Revised: Online: Published: 01 October 2004

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      • Received Date: 2015-08-19

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