Chin. J. Semicond. > 2002, Volume 23 > Issue 10 > 1088-1092

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p型扩散区(SiO_2/Si系扩Ga)的俄歇分析

孙瑛 and 王凤英

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Key words: SiO2层, 镓扩散, 重金属杂质, 俄歇分析

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    History

    Received: 19 August 2015 Revised: Online: Published: 01 October 2002

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      • Received Date: 2015-08-19

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