Chin. J. Semicond. > 2000, Volume 21 > Issue 11 > 1111-1115
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CONTENTS

组份线性渐变SiGe缓冲层的生长及其表征

李代宗 , 成步文 , 黄昌俊 , 王红杰 , 于卓 , 张春晖 , 余金中 and 王启明

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Key words: 超高真空化学气相淀积, SiGe, Raman散射, 俄歇电子能谱, X射线双晶衍射

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    Received: 20 August 2015 Revised: Online: Published: 01 November 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(11): 1111-1115
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      • Received Date: 2015-08-20

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