| Citation: |
Chen Weidong, Feng Lianghuan, Lei Zhi, Zhang Jingquan, Wu Lili, Cai Wei, Cai Yaping, Yao Feifei, Li Wei, Li Bing, Zheng Jiagui. Growth of AlSb Polycrystalline Films by Magnetron Sputtering and Annealing[J]. Journal of Semiconductors, 2006, In Press.
Chen W D, Feng L H, Lei Z, Zhang J Q, Wu L L, Cai W, Cai Y P, Yao F F, Li W, Li B, Zheng J G. Growth of AlSb Polycrystalline Films by Magnetron Sputtering and Annealing[J]. Chin. J. Semicond., 2006, 27(3): 541.
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Growth of AlSb Polycrystalline Films by Magnetron Sputtering and Annealing
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Abstract
AlSb thin films are prepared using two-stage processes.Al and Sb are deposited onto a glass substrate by magnetron sputtering to produce Al/Sb prefabricated films.The prefabricated films become polycrystalline after being annealed at 560℃ in argon atmosphere.Different film structures and compositions are characterized by X-ray diffraction and scanning electron microscopy.It is found that the polycrystalline AlSb films are uniformly packed with a grain size of about 20nm.Conductance activation energies of 0.21 and 0.321eV are obtained from the dark conductivity temperature curves.This will be useful for future fabrication of AlSb solar cells. -
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