Chin. J. Semicond. > 1989, Volume 10 > Issue 4 > 294-300

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快速热工艺氧化法生长超薄SiO_2层的研究

黄宜平 and C.A.Paz de Araujo

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    Received: 19 August 2015 Revised: Online: Published: 01 April 1989

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      • Received Date: 2015-08-19

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