SEMICONDUCTOR TECHNOLOGY

Lithography-independent and large scale fabrication of a metal electrode nanogap

Li Yan, Wang Xiaofeng, Zhang Jiayong, Wang Xiaodong, Fan Zhongchao and Yang Fuhua

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Abstract: A lithography-independent and wafer scale method to fabricate a metal nanogap structure is demonstrated. Polysilicon was first dry etched using photoresist (PR) as the etch mask patterned by photolithography. Then, by depositing conformal SiO2 on the polysilicon pattern, etching back SiO2 anisotropically in the perpendicular direction and removing the polysilicon with KOH, a sacrificial SiO2 spacer was obtained. Finally, after metal evaporation and lifting-off of the SiO2 spacer, an 82 nm metal-gap structure was achieved. The size of the nanogap is not determined by the photolithography, but by the thickness of the SiO2. The method reported in this paper is compatible with modern semiconductor technology and can be used in mass production.

Key words: lithography-independent

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    Received: 18 August 2015 Revised: 05 May 2009 Online: Published: 01 September 2009

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      Li Yan, Wang Xiaofeng, Zhang Jiayong, Wang Xiaodong, Fan Zhongchao, Yang Fuhua. Lithography-independent and large scale fabrication of a metal electrode nanogap[J]. Journal of Semiconductors, 2009, 30(9): 096003. doi: 10.1088/1674-4926/30/9/096003 Li Y, Wang X F, Zhang J Y, Wang X D, Fan Z C, Yang F H. Lithography-independent and large scale fabrication of a metal electrode nanogap[J]. J. Semicond., 2009, 30(9): 096003. doi: 10.1088/1674-4926/30/9/096003.Export: BibTex EndNote
      Citation:
      Li Yan, Wang Xiaofeng, Zhang Jiayong, Wang Xiaodong, Fan Zhongchao, Yang Fuhua. Lithography-independent and large scale fabrication of a metal electrode nanogap[J]. Journal of Semiconductors, 2009, 30(9): 096003. doi: 10.1088/1674-4926/30/9/096003

      Li Y, Wang X F, Zhang J Y, Wang X D, Fan Z C, Yang F H. Lithography-independent and large scale fabrication of a metal electrode nanogap[J]. J. Semicond., 2009, 30(9): 096003. doi: 10.1088/1674-4926/30/9/096003.
      Export: BibTex EndNote

      Lithography-independent and large scale fabrication of a metal electrode nanogap

      doi: 10.1088/1674-4926/30/9/096003
      • Received Date: 2015-08-18
      • Accepted Date: 2009-04-03
      • Revised Date: 2009-05-05
      • Published Date: 2009-08-28

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