J. Semicond. > 2010, Volume 31 > Issue 10 > 106001, doi: 10.1088/1674-4926/31/10/106001
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SEMICONDUCTOR TECHNOLOGY

Supercritical carbon dioxide process for releasing stuck cantilever beams

Hui Yu, Gao Chaoqun, Wang Lei and Jing Yupeng

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Abstract: The multi-SCCO2 (supercritical carbon dioxide) release and dry process based on our specialized SCCO2 semiconductor process equipment is investigated and the releasing mechanism is discussed. The experiment results show that stuck cantilever beams were held up again under SCCO2 high pressure treatment and the repeatability of this process is nearly 100%.

Key words: SCCO2

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    Received: 18 August 2015 Revised: 08 June 2010 Online: Published: 01 October 2010

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      Article Navigation >  Journal of Semiconductors  > 2010  >  31(10): 106001
      Hui Yu, Gao Chaoqun, Wang Lei, Jing Yupeng. Supercritical carbon dioxide process for releasing stuck cantilever beams[J]. Journal of Semiconductors, 2010, 31(10): 106001. doi: 10.1088/1674-4926/31/10/106001 Hui Y, Gao C Q, Wang L, Jing Y P. Supercritical carbon dioxide process for releasing stuck cantilever beams[J]. J. Semicond., 2010, 31(10): 106001. doi: 10.1088/1674-4926/31/10/106001.Export: BibTex EndNote
      Citation:
      Hui Yu, Gao Chaoqun, Wang Lei, Jing Yupeng. Supercritical carbon dioxide process for releasing stuck cantilever beams[J]. Journal of Semiconductors, 2010, 31(10): 106001. doi: 10.1088/1674-4926/31/10/106001

      Hui Y, Gao C Q, Wang L, Jing Y P. Supercritical carbon dioxide process for releasing stuck cantilever beams[J]. J. Semicond., 2010, 31(10): 106001. doi: 10.1088/1674-4926/31/10/106001.
      Export: BibTex EndNote
      shu

      Supercritical carbon dioxide process for releasing stuck cantilever beams

      doi: 10.1088/1674-4926/31/10/106001

      • Integrated Circuit Advanced Process Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

      • Integrated Circuit Advanced Process Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

      • Integrated Circuit Advanced Process Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

      • Integrated Circuit Advanced Process Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

      • Received Date: 2015-08-18
      • Accepted Date: 2010-04-01
      • Revised Date: 2010-06-08
      • Published Date: 2010-10-05

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