SEMICONDUCTOR TECHNOLOGY

Development of a virtual metrology for high-mix TFT-LCD manufacturing processes

Chen Shan, Pan Tianhong and Jang Shi-Shang

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Abstract: Nowadays, TFT-LCD manufacturing has become a very complex process, with many different products being manufactured with many different tools. The ability to predict the quality of product in such a high-mix system is critical to developing and maintaining a high yield. In this paper, a statistical method is proposed for building a virtual metrology model from a number of products using a high-mix manufacturing process. Stepwise regression is used to select “key variables" that really affect the quality of the products. Multivariate analysis of covariance is also proposed for simultaneously applying the selected variables and product effect. This framework provides a systematic method of building a processing quality prediction system for a high-mix manufacturing process. The experimental results show that the proposed quality prognostic system can not only estimate the critical dimension accurately but also detect potentially faulty glasses.

Key words: Stepwise regression, virtual metrology, MANCOVA, Thin Film Transistor Liquid Crystal Display (TFT-LCD)虚拟量测共变异数分析薄膜晶体管液晶显示器

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    Received: 18 August 2015 Revised: 23 June 2010 Online: Published: 01 November 2010

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      Chen Shan, Pan Tianhong, Jang Shi-Shang. Development of a virtual metrology for high-mix TFT-LCD manufacturing processes[J]. Journal of Semiconductors, 2010, 31(11): 116006. doi: 10.1088/1674-4926/31/11/116006 Chen S, Pan T H, Jang S S. Development of a virtual metrology for high-mix TFT-LCD manufacturing processes[J]. J. Semicond., 2010, 31(11): 116006. doi:  10.1088/1674-4926/31/11/116006.Export: BibTex EndNote
      Citation:
      Chen Shan, Pan Tianhong, Jang Shi-Shang. Development of a virtual metrology for high-mix TFT-LCD manufacturing processes[J]. Journal of Semiconductors, 2010, 31(11): 116006. doi: 10.1088/1674-4926/31/11/116006

      Chen S, Pan T H, Jang S S. Development of a virtual metrology for high-mix TFT-LCD manufacturing processes[J]. J. Semicond., 2010, 31(11): 116006. doi:  10.1088/1674-4926/31/11/116006.
      Export: BibTex EndNote

      Development of a virtual metrology for high-mix TFT-LCD manufacturing processes

      doi: 10.1088/1674-4926/31/11/116006
      • Received Date: 2015-08-18
      • Accepted Date: 2010-03-20
      • Revised Date: 2010-06-23
      • Published Date: 2010-10-31

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