| Citation: |
Ding Guojian, Guo Liwei, Xing Zhigang, Chen Yao, Xu Peiqiang, Jia Haiqiang, Zhou Junming, Chen Hong. Characteristics of GaN grown on 6H-SiC with different AlN buffers[J]. Journal of Semiconductors, 2010, 31(3): 033003. doi: 10.1088/1674-4926/31/3/033003
Ding G J, Guo L W, Xing Z G, Chen Y, Xu P Q, Jia H Q, Zhou J M, Chen H. Characteristics of GaN grown on 6H-SiC with different AlN buffers[J]. J. Semicond., 2010, 31(3): 033003. doi: 10.1088/1674-4926/31/3/033003.
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Characteristics of GaN grown on 6H-SiC with different AlN buffers
doi: 10.1088/1674-4926/31/3/033003
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Abstract
Characteristics of GaN grown on 6H-SiC (0001) substrates using different thicknesses of AlN buffers are studied. It is found that the surface morphology and crystal quality of GaN film closely depends on the strain state of the AlN buffer. For a thicker AlN buffer, there are cracks on GaN surface, which make the GaN films unsuitable for applications. While for a thinner AlN buffer, more dislocations are produced in the GaN film, which deteriorates the performance of GaN. Possible generation mechanisms of cracks and more dislocations are investigated and a 100 nm AlN buffer is suggested to be a better choice for high quality GaN on SiC.-
Keywords:
- GaN
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