SEMICONDUCTOR TECHNOLOGY

A multivariate process capability index model system

Wang Shaoxi and Wang Danghui

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Abstract: This paper presents a systematic multivariate process capability index (MPCI) method, which may provide references for assuring and improving process quality levels while achieving an overall evaluation of process quality. The system method includes a spatial MPCI model for multivariate normal distribution data, MPCI model based on factor weight for multivariate no-normal distribution application, and MPCI model based on yield for yield application. At last, examples for calculating MPCI are given, and the experimental results show that this systematic method is effective and practical.

Key words: microelectronics processmultivariateprocess capability indexyieldfactor weight

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    Received: 18 August 2015 Revised: 17 September 2010 Online: Published: 01 January 2011

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      Wang Shaoxi, Wang Danghui. A multivariate process capability index model system[J]. Journal of Semiconductors, 2011, 32(1): 016001. doi: 10.1088/1674-4926/32/1/016001 Wang S X, Wang D H. A multivariate process capability index model system[J]. J. Semicond., 2011, 32(1): 016001. doi: 10.1088/1674-4926/32/1/016001.Export: BibTex EndNote
      Citation:
      Wang Shaoxi, Wang Danghui. A multivariate process capability index model system[J]. Journal of Semiconductors, 2011, 32(1): 016001. doi: 10.1088/1674-4926/32/1/016001

      Wang S X, Wang D H. A multivariate process capability index model system[J]. J. Semicond., 2011, 32(1): 016001. doi: 10.1088/1674-4926/32/1/016001.
      Export: BibTex EndNote

      A multivariate process capability index model system

      doi: 10.1088/1674-4926/32/1/016001
      • Received Date: 2015-08-18
      • Accepted Date: 2010-04-14
      • Revised Date: 2010-09-17
      • Published Date: 2010-12-19

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