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Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing

Shen Pei, Zhang Wanrong, Huang Lu, Jin Dongyue and Xie Hongyun

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Abstract: An improved inductor layout with non-uniform metal width and non-uniform spacing is proposed to increase the quality factor (Q factor). For this inductor layout, from outer coil to inner coil, the metal width is reduced by an arithmetic-progression step, while the metal spacing is increased by a geometric-progression step. An improved layout with variable width and changed spacing is of benefit to the Q factor of RF spiral inductor improvement (approximately 42.86%), mainly due to the suppression of eddy-current loss by weakening the current crowding effect in the center of the spiral inductor. In order to increase the Q factor further, for the novel inductor, a patterned ground shield is used with optimized layout together. The results indicate that, in the range of 0.5 to 16 GHz, the Q factor of the novel inductor is at an optimum, which improves by 67% more than conventional inductors with uniform geometry dimensions (equal width and equal spacing), is enhanced by nearly 23% more than a PGS inductor with uniform geometry dimensions, and improves by almost 20% more than an inductor with an improved layout.

Key words: inductor layout optimizationvariable metal width and spacingintegrated RF inductorsilicon substrate

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    Received: 18 August 2015 Revised: 25 February 2011 Online: Published: 01 June 2011

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      Shen Pei, Zhang Wanrong, Huang Lu, Jin Dongyue, Xie Hongyun. Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing[J]. Journal of Semiconductors, 2011, 32(6): 064011. doi: 10.1088/1674-4926/32/6/064011 Shen P, Zhang W R, Huang L, Jin D Y, Xie H Y. Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing[J]. J. Semicond., 2011, 32(6): 064011. doi: 10.1088/1674-4926/32/6/064011.Export: BibTex EndNote
      Citation:
      Shen Pei, Zhang Wanrong, Huang Lu, Jin Dongyue, Xie Hongyun. Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing[J]. Journal of Semiconductors, 2011, 32(6): 064011. doi: 10.1088/1674-4926/32/6/064011

      Shen P, Zhang W R, Huang L, Jin D Y, Xie H Y. Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing[J]. J. Semicond., 2011, 32(6): 064011. doi: 10.1088/1674-4926/32/6/064011.
      Export: BibTex EndNote

      Improving the quality factor of an RF spiral inductor with non-uniform metal width and non-uniform coil spacing

      doi: 10.1088/1674-4926/32/6/064011
      • Received Date: 2015-08-18
      • Accepted Date: 2010-11-04
      • Revised Date: 2011-02-25
      • Published Date: 2011-05-23

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