| Citation: |
Pan Pan, An Junming, Wang Liangliang, Wu Yuanda, Wang Yue, Hu Xiongwei. Design and fabrication of an InP arrayed waveguide grating for monolithic PICs[J]. Journal of Semiconductors, 2012, 33(7): 074010. doi: 10.1088/1674-4926/33/7/074010
Pan P, An J M, Wang L L, Wu Yuanda, Wang Y, Hu X W. Design and fabrication of an InP arrayed waveguide grating for monolithic PICs[J]. J. Semicond., 2012, 33(7): 074010. doi: 10.1088/1674-4926/33/7/074010.
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Design and fabrication of an InP arrayed waveguide grating for monolithic PICs
doi: 10.1088/1674-4926/33/7/074010
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Abstract
A 10-channel, 200 GHz channel spacing InP arrayed waveguide grating was designed, and the deep ridge waveguide design makes it polarization independent. Under the technologies of molecular beam epitaxy, lithography, and induced coupler plasma etching, the chip was fabricated in our laboratory. The test results show that the insertion loss is about --8 dB, and the crosstalk is less than --17 dB.-
Keywords:
- InP AWG,
- monolithic PICs,
- polarization independence
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References
[1] [2] [3] [4] [5] [6] [7] [8] [9] [10] [11] -
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