SEMICONDUCTOR DEVICES

Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM

Yinhong Luo, Fengqi Zhang, Hongxia Guo, Yao Xiao, Wen Zhao, Lili Ding and Yuanming Wang

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 Corresponding author: Luo Yinhong, Email: luoyinhong@nint.ac.cn

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Abstract: Single event multiple-cell upsets (MCU) increase sharply with the semiconductor devices scaling. The impacts of several test factors on heavy ion single event MCU in 65 nm SRAM are studied based on the buildup of MCU test data acquiring and processing technique, including the heavy ion LET, the tilt angle, the device orientation, the test pattern and the supply voltage; the MCU physical bitmaps are extracted correspondingly. The dependencies of parameters such as the MCU percentage, MCU mean and topological pattern on these factors are summarized and analyzed. This work is meaningful for developing a more reasonable single event test method and assessing the effectiveness of anti-MCU strategies on nanometer-scale devices.

Key words: multiple-cell upsetsnanometer-scale SRAMtest factorsdevice orientation



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Fig. 1.  M328C heavy ion single event bit upset cross section as a function of the effective LET.

Fig. 2.  SCU and MCU event percentage as a function of heavy ion LET.

Fig. 3.  MCU and SCU event percentage versus tilt angle along $y$-axis for fluorine ion.

Fig. 4.  Percentage of SCU and MCU event with tilting incidence along different device orientation.

Fig. 5.  Nine adjacent SRAM cells: dashed rectangles are bitcells. Striped and white squares are respectively drains of NMOS and PMOS. Black squares are sensitive drains of off-NMOS and off-PMOS.

Fig. 6.  M328C SCU and MCU event percentage with different test patterns for Cl ion.

Fig. 7.  Percentage of SCU and MCU event versus supply voltage with incidence of Chlorine ion.

Table 1.   Ions used in heavy ion accelerator experiment.

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Table 2.   MCU percentage of different topological patterns versus LET.

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Table 3.   MCU percentage of different topological pattern versus device orientation for fluorine ion.

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    Received: 11 June 2015 Revised: Online: Published: 01 November 2015

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      Yinhong Luo, Fengqi Zhang, Hongxia Guo, Yao Xiao, Wen Zhao, Lili Ding, Yuanming Wang. Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM[J]. Journal of Semiconductors, 2015, 36(11): 114009. doi: 10.1088/1674-4926/36/11/114009 Y H Luo, F Q Zhang, H X Guo, Y Xiao, W Zhao, L L Ding, Y M Wang. Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM[J]. J. Semicond., 2015, 36(11): 114009. doi: 10.1088/1674-4926/36/11/114009.Export: BibTex EndNote
      Citation:
      Yinhong Luo, Fengqi Zhang, Hongxia Guo, Yao Xiao, Wen Zhao, Lili Ding, Yuanming Wang. Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM[J]. Journal of Semiconductors, 2015, 36(11): 114009. doi: 10.1088/1674-4926/36/11/114009

      Y H Luo, F Q Zhang, H X Guo, Y Xiao, W Zhao, L L Ding, Y M Wang. Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM[J]. J. Semicond., 2015, 36(11): 114009. doi: 10.1088/1674-4926/36/11/114009.
      Export: BibTex EndNote

      Impacts of test factors on heavy ion single event multiple-cell upsets in nanometer-scale SRAM

      doi: 10.1088/1674-4926/36/11/114009
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      • Corresponding author: Luo Yinhong, Email: luoyinhong@nint.ac.cn
      • Received Date: 2015-06-11
      • Accepted Date: 2015-07-09
      • Published Date: 2015-01-25

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