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Vertical β-Ga2O3 power electronics

Guangwei Xu, Feihong Wu, Qi Liu, Zhao Han, Weibing Hao, Jinbo Zhou, Xuanze Zhou, Shu Yang and Shibing Long

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 Corresponding author: Guangwei Xu, xugw@ustc.edu.cn; Shibing Long, shibinglong@ustc.edu.cn

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[1]
Green A J, Speck J, Xing G, et alβ-Gallium oxide power electronicsAPL Mater202210029201
[2]
Yuan Y, Hao W B, Mu W X, et alToward emerging gallium oxide semiconductors: A roadmapFundam Res20211697
[3]
Chen H, Wang H Y, Wang C, et alLow specific on-resistance and low leakage current β-Ga2O3 (001) Schottky barrier diode through contact pre-treatment. 2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD)2022145
[4]
He Q M, Hao W B, Zhou X Z, et alOver 1 GW/cm2 vertical Ga2O3 Schottky barrier diodes without edge terminationIEEE Electron Device Lett202243264
[5]
Hou C X, Gazoni R M, Reeves R J, et al. Oxidized metal Schottky contacts on (010) β-Ga2O3IEEE Electron Device Lett201940337
[6]
Jian G Z, Hao W B, Shi Z Y, et al. Elevated barrier height originated from electric dipole effect and improved breakdown characteristics in PtOx/β-Ga2O3 Schottky barrier diodes. J Phys D: Appl Phys202255304003
[7]
Harada T, Ito S, Tsukazaki A. Electric dipole effect in PdCoO2/β-Ga2O3 Schottky diodes for high-temperature operation. Sci Adv20195eaax5733
[8]
Xiong W H, Zhou X Z, Xu G W, et al. Double-barrier β-Ga2O3 Schottky barrier diode with low turn-on voltage and leakage current. IEEE Electron Device Lett202142430
[9]
Lingaparthi R, Sasaki K, Thieu Q T, et al. Surface related tunneling leakage in β-Ga2O3 (001) vertical Schottky barrier diodes. Appl Phys Express201912074008
[10]
Hao W B, He Q M, Zhou K, et al. Low defect density and small I–V curve hysteresis in NiO/β-Ga2O3 pn diode with a high PFOM of 0.65 GW/cm2Appl Phys Lett2021118043501
[11]
Konishi K, Goto K, Murakami H, et al1-kV vertical Ga2O3 field-plated Schottky barrier diodesAppl Phys Lett2017110103506
[12]
Roy S, Bhattacharyya A, Peterson C, et al. 2.1 kV (001)-β-Ga2O3 vertical Schottky barrier diode with high-k oxide field plate. Appl Phys Lett2023122152101
[13]
He Q M, Zhou X Z, Li Q Y, et alSelective high-resistance zones formed by oxygen annealing for-GaO Schottky diode applicationsIEEE Electron Device Lett2022431933
[14]
Lin C H, Yuda Y, Wong M H, et alVertical Ga2O3 Schottky barrier diodes with guard ring formed by nitrogen-ion implantationIEEE Electron Device Lett2019401487
[15]
Lu X, Zhang X, Jiang H X, et al. Vertical β-Ga2O3 Schottky barrier diodes with enhanced breakdown voltage and high switching performance. Phys Status Solidi A20202171900497
[16]
Hao W B, He Q M, Zhou X Z, et al2.6 kV NiO/Ga2O3 heterojunction diode with superior high-temperature voltage blocking capability. 2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD)2022105
[17]
Hao W B, Wu F H, Li W S, et al. High-performance vertical β-Ga2O3 Schottky barrier diodes featuring P-NiO JTE with adjustable conductivity. 2022 International Electron Devices Meeting (IEDM)2023, 9.5.1
[18]
Hao W B, Wu F H, Li W S, et al. Improved vertical β-Ga2O3 Schottky barrier diodes with conductivity-modulated p-NiO junction termination extension. IEEE Trans Electron Devices2023702129
[19]
Sasaki K, Wakimoto D, Thieu Q T, et alFirst demonstration of Ga2O3 trench MOS-type Schottky barrier diodesIEEE Electron Device Lett201738783
[20]
Li W S, Nomoto K, Hu Z Y, et alField-plated Ga2O3 trench Schottky barrier diodes with a BV2/Ron, Rsp of up to 0.95 GW//cm2IEEE Electron Device Lett202041107
[21]
Li W S, Nomoto K, Hu Z Y, et alFin-channel orientation dependence of forward conduction in kV-class Ga2O3 trench Schottky barrier diodesAppl Phys Express201912061007
[22]
Li W, Nomoto K, Hu Z, et alSingle and multi-fin normally-off Ga2O3 vertical transistors with a breakdown voltage over 2.6 kV. 2019 IEEE International Electron Devices Meeting (IEDM)202012.4.1
[23]
Wong M H, Murakami H, Kumagai Y, et al. Enhancement-mode β-Ga2O3 current aperture vertical MOSFETs with N-ion-implanted blocker. IEEE Electron Device Lett202041296
[24]
Zeng K, Soman R, Bian Z L, et alVertical Ga2O3 MOSFET with magnesium diffused current blocking layerIEEE Electron Device Lett2022431527
[25]
Zhou X Z, Ma Y J, Xu G W, et al. Enhancement-mode β-Ga2O3 U-shaped gate trench vertical MOSFET realized by oxygen annealing. Appl Phys Lett2022121223501
[26]
Wakimoto D, Lin C H, Thieu Q T, et al. Nitrogen-doped β-Ga2O3 vertical transistors with a threshold voltage of ≥1.3 V and a channel mobility of 100 cm2V–1s–1Appl Phys Express202316036503
[27]
Ma Y J, Zhou X Z, Tang W B, et al. 702.3 A·cm−2/10.4 mΩ·cm2 β-Ga2O3 U-shape trench gate MOSFET with N-ion implantation. IEEE Electron Device Lett202344384
Fig. 1.  (Color online) The schematic diagram of the roadmap and structures for SBDs. Surface engineering technique (a), and edge termination techniques (b-e) have emerged in recent years.

Fig. 2.  (Color online) The schematic diagram of four kinds of vertical transistors, (a) fin field-effect transistor (FinFET), (b) current aperture vertical electron transistor (CAVET), (c) vertical diffused barrier field-effect transistor (VDBFET), and (d) U-shaped gate trench MOSFET (U-MOSFET).

[1]
Green A J, Speck J, Xing G, et alβ-Gallium oxide power electronicsAPL Mater202210029201
[2]
Yuan Y, Hao W B, Mu W X, et alToward emerging gallium oxide semiconductors: A roadmapFundam Res20211697
[3]
Chen H, Wang H Y, Wang C, et alLow specific on-resistance and low leakage current β-Ga2O3 (001) Schottky barrier diode through contact pre-treatment. 2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD)2022145
[4]
He Q M, Hao W B, Zhou X Z, et alOver 1 GW/cm2 vertical Ga2O3 Schottky barrier diodes without edge terminationIEEE Electron Device Lett202243264
[5]
Hou C X, Gazoni R M, Reeves R J, et al. Oxidized metal Schottky contacts on (010) β-Ga2O3IEEE Electron Device Lett201940337
[6]
Jian G Z, Hao W B, Shi Z Y, et al. Elevated barrier height originated from electric dipole effect and improved breakdown characteristics in PtOx/β-Ga2O3 Schottky barrier diodes. J Phys D: Appl Phys202255304003
[7]
Harada T, Ito S, Tsukazaki A. Electric dipole effect in PdCoO2/β-Ga2O3 Schottky diodes for high-temperature operation. Sci Adv20195eaax5733
[8]
Xiong W H, Zhou X Z, Xu G W, et al. Double-barrier β-Ga2O3 Schottky barrier diode with low turn-on voltage and leakage current. IEEE Electron Device Lett202142430
[9]
Lingaparthi R, Sasaki K, Thieu Q T, et al. Surface related tunneling leakage in β-Ga2O3 (001) vertical Schottky barrier diodes. Appl Phys Express201912074008
[10]
Hao W B, He Q M, Zhou K, et al. Low defect density and small I–V curve hysteresis in NiO/β-Ga2O3 pn diode with a high PFOM of 0.65 GW/cm2Appl Phys Lett2021118043501
[11]
Konishi K, Goto K, Murakami H, et al1-kV vertical Ga2O3 field-plated Schottky barrier diodesAppl Phys Lett2017110103506
[12]
Roy S, Bhattacharyya A, Peterson C, et al. 2.1 kV (001)-β-Ga2O3 vertical Schottky barrier diode with high-k oxide field plate. Appl Phys Lett2023122152101
[13]
He Q M, Zhou X Z, Li Q Y, et alSelective high-resistance zones formed by oxygen annealing for-GaO Schottky diode applicationsIEEE Electron Device Lett2022431933
[14]
Lin C H, Yuda Y, Wong M H, et alVertical Ga2O3 Schottky barrier diodes with guard ring formed by nitrogen-ion implantationIEEE Electron Device Lett2019401487
[15]
Lu X, Zhang X, Jiang H X, et al. Vertical β-Ga2O3 Schottky barrier diodes with enhanced breakdown voltage and high switching performance. Phys Status Solidi A20202171900497
[16]
Hao W B, He Q M, Zhou X Z, et al2.6 kV NiO/Ga2O3 heterojunction diode with superior high-temperature voltage blocking capability. 2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD)2022105
[17]
Hao W B, Wu F H, Li W S, et al. High-performance vertical β-Ga2O3 Schottky barrier diodes featuring P-NiO JTE with adjustable conductivity. 2022 International Electron Devices Meeting (IEDM)2023, 9.5.1
[18]
Hao W B, Wu F H, Li W S, et al. Improved vertical β-Ga2O3 Schottky barrier diodes with conductivity-modulated p-NiO junction termination extension. IEEE Trans Electron Devices2023702129
[19]
Sasaki K, Wakimoto D, Thieu Q T, et alFirst demonstration of Ga2O3 trench MOS-type Schottky barrier diodesIEEE Electron Device Lett201738783
[20]
Li W S, Nomoto K, Hu Z Y, et alField-plated Ga2O3 trench Schottky barrier diodes with a BV2/Ron, Rsp of up to 0.95 GW//cm2IEEE Electron Device Lett202041107
[21]
Li W S, Nomoto K, Hu Z Y, et alFin-channel orientation dependence of forward conduction in kV-class Ga2O3 trench Schottky barrier diodesAppl Phys Express201912061007
[22]
Li W, Nomoto K, Hu Z, et alSingle and multi-fin normally-off Ga2O3 vertical transistors with a breakdown voltage over 2.6 kV. 2019 IEEE International Electron Devices Meeting (IEDM)202012.4.1
[23]
Wong M H, Murakami H, Kumagai Y, et al. Enhancement-mode β-Ga2O3 current aperture vertical MOSFETs with N-ion-implanted blocker. IEEE Electron Device Lett202041296
[24]
Zeng K, Soman R, Bian Z L, et alVertical Ga2O3 MOSFET with magnesium diffused current blocking layerIEEE Electron Device Lett2022431527
[25]
Zhou X Z, Ma Y J, Xu G W, et al. Enhancement-mode β-Ga2O3 U-shaped gate trench vertical MOSFET realized by oxygen annealing. Appl Phys Lett2022121223501
[26]
Wakimoto D, Lin C H, Thieu Q T, et al. Nitrogen-doped β-Ga2O3 vertical transistors with a threshold voltage of ≥1.3 V and a channel mobility of 100 cm2V–1s–1Appl Phys Express202316036503
[27]
Ma Y J, Zhou X Z, Tang W B, et al. 702.3 A·cm−2/10.4 mΩ·cm2 β-Ga2O3 U-shape trench gate MOSFET with N-ion implantation. IEEE Electron Device Lett202344384
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    Received: 26 June 2023 Revised: Online: Accepted Manuscript: 29 June 2023Uncorrected proof: 30 June 2023Corrected proof: 05 July 2023Published: 10 July 2023

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      Guangwei Xu, Feihong Wu, Qi Liu, Zhao Han, Weibing Hao, Jinbo Zhou, Xuanze Zhou, Shu Yang, Shibing Long. Vertical β-Ga2O3 power electronics[J]. Journal of Semiconductors, 2023, 44(7): 070301. doi: 10.1088/1674-4926/44/7/070301 G W Xu, F H Wu, Q Liu, Z Han, W B Hao, J B Zhou, X Z Zhou, S Yang, S B Long. Vertical β-Ga2O3 power electronics[J]. J. Semicond, 2023, 44(7): 070301. doi: 10.1088/1674-4926/44/7/070301Export: BibTex EndNote
      Citation:
      Guangwei Xu, Feihong Wu, Qi Liu, Zhao Han, Weibing Hao, Jinbo Zhou, Xuanze Zhou, Shu Yang, Shibing Long. Vertical β-Ga2O3 power electronics[J]. Journal of Semiconductors, 2023, 44(7): 070301. doi: 10.1088/1674-4926/44/7/070301

      G W Xu, F H Wu, Q Liu, Z Han, W B Hao, J B Zhou, X Z Zhou, S Yang, S B Long. Vertical β-Ga2O3 power electronics[J]. J. Semicond, 2023, 44(7): 070301. doi: 10.1088/1674-4926/44/7/070301
      Export: BibTex EndNote

      Vertical β-Ga2O3 power electronics

      doi: 10.1088/1674-4926/44/7/070301
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      • Author Bio:

        Guangwei Xu received his PhD from the Institute of Microelectronics of the Chinese Academy of Sciences in 2017. Then, he joined the University of California, Los Angeles as a postdoc. He joined the University of Science and Technology of China as an associate research fellow in the Shibing Long Group from 2019. His research focuses on Beta-Gallium Oxide power device fabrication, device defect state measurement and device modeling

        Shu Yang is a professor at the School of Microelectronics, University of Science and Technology of China. She received her B.S. degree from Fudan University and Ph.D. degree from Hong Kong University of Science and Technology (HKUST). She was a visiting assistant professor at HKUST, postdoctoral research associate at the University of Cambridge, and professor at Zhejiang University. Her research focuses on fabrication, characterization and application of wide-bandgap semiconductor power devices

        Shibing Long is a full professor at the School of Microelectronics, University of Science and Technology of China. He received his PhD from the Institute of Microelectronics of the Chinese Academy of Sciences in 2005. Then, he worked there from 2005 to 2018 and joined the University of Science and Technology of China in 2018. His research focuses on micro- and nanofabrication, RRAM, ultrawide bandgap semiconductor devices (power devices and detectors) and memory circuit design

      • Corresponding author: xugw@ustc.edu.cnshibinglong@ustc.edu.cn
      • Received Date: 2023-06-26
        Available Online: 2023-06-29

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