Chin. J. Semicond. > 1986, Volume 7 > Issue 5 > 480-488
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硅中过饱和砷在后退火过程中的析出及其对硅原子移位影响的实验研究

卢志恒 , 张孝吉 and W.K.Chu

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1986

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      Article Navigation >  Journal of Semiconductors  > 1986  >  7(5): 480-488
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      • Received Date: 2015-08-20

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