| Citation: |
Hwang Pol, Li Baohe, Yang Tao, Zhai Zhonghai, Zhu Fengwu. Characterization of (CoCr/Pt)20 Namomultilayers Preparation by Magnetron Sputtring[J]. Journal of Semiconductors, 2005, In Press.
Hwang P, Li B H, Yang T, Zhai Z H, Zhu F W. Characterization of (CoCr/Pt)20 Namomultilayers Preparation by Magnetron Sputtring[J]. Chin. J. Semicond., 2005, 26(13): 65.
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Characterization of (CoCr/Pt)20 Namomultilayers Preparation by Magnetron Sputtring
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Abstract
(CoCr/Pt) 20 nanomultilayers with Pt underlayers are prepared by DC magnetron sputtering and the effect of sputtering Ar gas pressure on microstructure and magnetic properties of (CoCr/Pt)20 nanomultilayers is studied.The results show that sputtering Ar gas pressure has a great effect on microstructure,perpendicular magnetic anisotropy,and coercivity of (CoCr/Pt)20 nanomultilayers.For all samples,the effective magnetic anisotropy constant Keff＞0 and all samples have perpendicular magnetic anisotropy.The X-ray diffraction patterns show that low angle X-ray diffraction peaks are very sharp.This confirms the good quality of the multilayers and the bilayer periodicity of films.With increasing of sputtering Ar gas pressure,perpendicular and in-plane coercivity of the samples increase,but the effective magnetic anisotropy constant decreases.The images of atomic force microscopy show that when the sputtering Ar gas pressure is increased,both average grain size and the surface roughness are increased,which lead to the increase of perpendicular coercivity and the decrease of effective magnetic anisotropy constant. -
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