Chin. J. Semicond. > 2004, Volume 25 > Issue 7 > 766-770
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一种用于暗域交替式相移掩模设计的自适应版图划分方法(英文)

王迪 , 吴为民 and 洪先龙

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Key words: 集成电路计算机辅助设计, 相移掩模, 划分, 相位冲突, 可制造性设计

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    Received: 19 August 2015 Revised: Online: Published: 01 July 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(7): 766-770
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      • Received Date: 2015-08-19

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