Chin. J. Semicond. > 2006, Volume 27 > Issue 8 > 1458-1462

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Optimization of the Electron Blocking Layer in GaN Laser Diodes

Li Ti, Pan Huapu, Xu Ke and Hu Xiaodong

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Abstract: In view of the transport mechanism of electrical carriers,the factors involved in the current overflow in GaN-based laser diodes are analyzed,and the aluminum mole fraction as well as the p-doping concentration of the AlGaN electron blocking layer are optimized.The results indicate that the appropriate barrier height (the Al mole fraction) is lower when the p-doping concentration is higher.

Key words: semiconductor laser diodeGaNAlGaNelectron blocking layer

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    Received: 18 August 2015 Revised: 19 March 2006 Online: Published: 01 August 2006

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      Li Ti, Pan Huapu, Xu Ke, Hu Xiaodong. Optimization of the Electron Blocking Layer in GaN Laser Diodes[J]. Journal of Semiconductors, 2006, In Press. Li T, Pan H P, Xu K, Hu X D. Optimization of the Electron Blocking Layer in GaN Laser Diodes[J]. Chin. J. Semicond., 2006, 27(8): 1458.Export: BibTex EndNote
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      Li Ti, Pan Huapu, Xu Ke, Hu Xiaodong. Optimization of the Electron Blocking Layer in GaN Laser Diodes[J]. Journal of Semiconductors, 2006, In Press.

      Li T, Pan H P, Xu K, Hu X D. Optimization of the Electron Blocking Layer in GaN Laser Diodes[J]. Chin. J. Semicond., 2006, 27(8): 1458.
      Export: BibTex EndNote

      Optimization of the Electron Blocking Layer in GaN Laser Diodes

      • Received Date: 2015-08-18
      • Accepted Date: 2006-01-12
      • Revised Date: 2006-03-19
      • Published Date: 2006-10-12

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