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High contrast ratio, high uniformity multiple quantum well spatial light modulators

Huang Yuyang, Liu H C, Wasilewski Z, Buchanan M, Laframboise S R, Yang Chen, Cui Guoxin, Bian Lifeng, Yang Hui and Zhang Yaohui

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Abstract: Our latest research results on GaAs–AlGaAs multiple quantum well spatial light modulators are presented. The thickness uniformity of the epitaxial layers across the 3-inch wafer grown by our molecular beam epitaxy is better than 0.1% and the variation of cavity resonance wavelength within the wafer is only 0.9 nm. A contrast ratio (CR) of 102 by varying bias voltage from 0 to 6.7 V is achieved after fine tuning the cavity by etching an adjust layer. Both theoretical and experimental results demonstrate that incorporating an adjust layer is an effective tuning method for obtaining high CR.

Key words: spatial light modulator; multiple quantum well; uniformity; contrast ratio; adjust layer; matching condition

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    Received: 18 August 2015 Revised: 20 October 2009 Online: Published: 01 March 2010

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      Huang Yuyang, Liu H C, Wasilewski Z, Buchanan M, Laframboise S R, Yang Chen, Cui Guoxin, Bian Lifeng, Yang Hui, Zhang Yaohui. High contrast ratio, high uniformity multiple quantum well spatial light modulators[J]. Journal of Semiconductors, 2010, 31(3): 034007. doi: 10.1088/1674-4926/31/3/034007 Huang Y Y, Liu H C, Wasilewski Z, Buchanan M, Laframboise S R, Yang C, Cui G X, Bian L F, Yang H, Zhang Y H. High contrast ratio, high uniformity multiple quantum well spatial light modulators[J]. J. Semicond., 2010, 31(3): 034007. doi:  10.1088/1674-4926/31/3/034007.Export: BibTex EndNote
      Citation:
      Huang Yuyang, Liu H C, Wasilewski Z, Buchanan M, Laframboise S R, Yang Chen, Cui Guoxin, Bian Lifeng, Yang Hui, Zhang Yaohui. High contrast ratio, high uniformity multiple quantum well spatial light modulators[J]. Journal of Semiconductors, 2010, 31(3): 034007. doi: 10.1088/1674-4926/31/3/034007

      Huang Y Y, Liu H C, Wasilewski Z, Buchanan M, Laframboise S R, Yang C, Cui G X, Bian L F, Yang H, Zhang Y H. High contrast ratio, high uniformity multiple quantum well spatial light modulators[J]. J. Semicond., 2010, 31(3): 034007. doi:  10.1088/1674-4926/31/3/034007.
      Export: BibTex EndNote

      High contrast ratio, high uniformity multiple quantum well spatial light modulators

      doi: 10.1088/1674-4926/31/3/034007
      • Received Date: 2015-08-18
      • Accepted Date: 2009-09-17
      • Revised Date: 2009-10-20
      • Published Date: 2010-02-08

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