Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer

Ning Jin; Liu Huanzhang; Ge Yongcai; Liu Zhongli

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Ning Jin, Liu Huanzhang, Ge Yongcai, Liu Zhongli. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Journal of Semiconductors, 2003, In Press. Ning J, Liu H Z, Ge Y C, Liu Z L. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Chin. J. Semicond., 2003, 24(S1): 187.Export: BibTex EndNote

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Ning Jin, Liu Huanzhang, Ge Yongcai, Liu Zhongli. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Journal of Semiconductors, 2003, In Press.

Ning J, Liu H Z, Ge Y C, Liu Z L. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Chin. J. Semicond., 2003, 24(S1): 187.

Export: BibTex EndNote

Citation:

Ning Jin, Liu Huanzhang, Ge Yongcai, Liu Zhongli. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Journal of Semiconductors, 2003, In Press.

Ning J, Liu H Z, Ge Y C, Liu Z L. Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer[J]. Chin. J. Semicond., 2003, 24(S1): 187.

Export: BibTex EndNote

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Fabrication of Silicon Condenser Microphone Using Porous Silicon aa Sacrificial Layer

Microelectronics R&D Center, Institute of Semiconductors, The Chinese Academy of Sciences, Beijing 100083, China,Microelectronics R&D Center, Institute of Semiconductors, The Chinese Academy of Sciences, Beijing 100083, China,Microelectronics R&D Center, Institute of Semiconductors, The Chinese Academy of Sciences, Beijing 100083, China and Microelectronics R&D Center, Institute of Semiconductors, The Chinese Academy of Sciences, Beijing 100083, China

Received Date: 2016-03-16
Published Date: 2016-03-15

Abstract

Abstract

A new technology for the fabrication of silicon condenser microphones is presented. The technology is based on the use of porous silicon as sacrificial layer for the acoustic holes and the polyimide diaphragm for the acoustic membrane. The microphone with an open-circuit sensitivity of -107. 8dB and a flatter frequency response between 400Hz and 10kHz has been fabricated with this technology. The microphone can be used for acoustic communication.
- silicon condenser microphone,
- porous silicon,
- sacrificial layer,
- polyimide

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