SEMICONDUCTOR DEVICES

Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique

Paragjyoti Gogoi, Rajib Saikia and Sanjib Changmai

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 Corresponding author: Paragjyoti Gogoi, E-mail: paragjyoti_g@rediffmail.com

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Abstract: ZnO thin films were prepared by a simple chemical bath deposition technique using an inorganic solution mixture of ZnCl2 and NH3 on glass substrates and then were used as the active material in thin film transistors (TFTs). The TFTs were fabricated in a top gate coplanar electrode structure with high-k Al2O3 as the gate insulator and Al as the source, drain and gate electrodes. The TFTs were annealed in air at 500 ℃ for 1 h. The TFTs with a 50 μm channel length exhibited a high field-effect mobility of 0.45 cm2/(V·s) and a low threshold voltage of 1.8 V. The sub-threshold swing and drain current ON-OFF ratio were found to be 0.6 V/dec and 106, respectively.

Key words: chemical bath depositionthin film transistorselectrical properties



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Fig. 1.  The schematic structure of the top gate coplanar electrode structure of the TFTs.

Fig. 2.  XRD spectrum of the ZnO thin film.

Fig. 3.  An SEM image of the ZnO thin film annealed at 500 C.

Fig. 4.  $I_{\rm D}$-$V_{\rm D}$ characteristics of the ZnO TFTs at constant $V_{\rm G}$.

Fig. 5.  $I_{\rm D}^{1/2}$ -$V_{\rm G}$ plots for ZnO TFTs at a constant drain voltage $V_{\rm D}$ $=$ 8 V.

Fig. 6.  Plot of lg $I_{\rm D}$-$V_{\rm G}$ at a constant drain voltage $V_{\rm D}$ $=$ 8 V.

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Table 1.   Measured values of mobility ($\mu_{\rm FET})$, threshold voltage ($V_{\rm T})$, ON-OFF ratio and sub-threshold swing of the fabricated devices and comparison of these parameters with some previous results[1, 3, 4] with different gate dielectrics and methods of preparation.

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    Received: 14 August 2014 Revised: Online: Published: 01 April 2015

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      Paragjyoti Gogoi, Rajib Saikia, Sanjib Changmai. Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique[J]. Journal of Semiconductors, 2015, 36(4): 044002. doi: 10.1088/1674-4926/36/4/044002 P Gogoi, R Saikia, S Changmai. Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique[J]. J. Semicond., 2015, 36(4): 044002. doi: 10.1088/1674-4926/36/4/044002.Export: BibTex EndNote
      Citation:
      Paragjyoti Gogoi, Rajib Saikia, Sanjib Changmai. Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique[J]. Journal of Semiconductors, 2015, 36(4): 044002. doi: 10.1088/1674-4926/36/4/044002

      P Gogoi, R Saikia, S Changmai. Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique[J]. J. Semicond., 2015, 36(4): 044002. doi: 10.1088/1674-4926/36/4/044002.
      Export: BibTex EndNote

      Top gate ZnO-Al2O3 thin film transistors fabricated using a chemical bath deposition technique

      doi: 10.1088/1674-4926/36/4/044002
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      • Corresponding author: E-mail: paragjyoti_g@rediffmail.com
      • Received Date: 2014-08-14
      • Published Date: 2015-01-25

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